ITO Sputtering Target

ITO sputtering target - ITO material

By adjusting the sintering pressure, we achieved high-performance ITO sputtering target, which with fewer surface nodule. The ITO film made with our ITO sputtering target is with lower surface roughness, higher optical transmittance, and less etching residue. Therefore, the effective improvement of the quality of ITO material improves the performance of the transparent conductive oxide film.

PHILDAL HOLDING CO., LIMITED provides ITO sputtering target with high quality and competitive price, including ITO planar target and ITO rotary sputtering target.

Photos of our ITO sputtering targets: New targets and Used targets

New ITO planar target

Used ITO planar target

New ITO rotary target

Used ITO rotary target

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Please feel free to send us an inquire for the quotation of ITO sputtering targets or other thin film materials that are not listed. We will reply you within one working day.

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